CONTROLLED CONTINUOUS FLOW TECHNOLOGYThe unique patented CCFT™ - Controlled Continuous Flow Technology - is used for chemical etch and chemical deposition processes. memsstar® processes reduce issues such as MEMS stiction, compared to other vapour phase or liquid based systems.
Benefits of CCFT™ include the following;
- Faster process times, highly efficient gas usage, lower COO
- Faster etch rates, unrivalled selectivities
- Multi stage processing, e.g. breakthrough, bulk, soft etch steps
- Process windows for many materials and layouts
- Unrivalled wafer uniformity and repeatability
- Robust Films with superior tunable properties
- Integrated release etch and then surface modification
|
Marketing Brochure Process control - an essential requirement for MEMS etching and deposition
|
