NEW CCFT ANNOUNCED AT SEMICON WEST

10.07.2006

memsstar® technology announced their unique Controlled Continuous Flow Technology (CCFT™) at Semicon West in San Francisco, as part of the memsstar® product range. memsstar® is used for MEMS release etching and depositing coatings.

By precise control of the delivery of materials into the process chamber, each process module is able to achieve a highly controllable and repeatable reaction on the substrate. This patented technology is applied across the full range of process modules including SVR, SPD and OVR, and offers unique performance in both etch and deposition.

CCFT™ also enables the highly efficient use of materials and their safe disposal. A full range of process controls ensures that the important process characteristics such as etch rate, uniformity, conformality, particles and many others, are repeatably achieved.

" The architecture and process controls which comprise CCFT are an exciting development for the MEMS industry", said Dr Tony O'Hara, Senior technologist at memsstar® technology. "We are now able to meet the most stringent process requirements, with benchmark performance across the process module range"